Author: Joe Qi
Joe Qi is a postdoc fellow working in Dr. Fauchet's lab at Vanderbilt University.

Porous nanocrystalline germanium (pnc-Ge) membranes

Hello everyone! I’d like to show you some recent result about pnc-Ge membrane. We have been thinking to replace Si with Ge for a long time to see whether we can transfer pore formation to another materials other than silicon.

Posted in NRG

More in-situ heating videos

Here are some other in-situ heating videos I made recently. First one is NSN30730, which means the Si is 7nm and Si3N4 is 30nm. The speed of the video is 10 time faster than the real time. The first figure

Posted in NRG

Pores in SiO2 layer

Here is an interesting discovery of nanopores in the SiO2 layer after the laser annealing. Basically I was doing laser annealing on free-standing OS membrane the other day. It’s an excimer laser  with 248nm wavelength, 25ns FWHM and spot size

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In-situ heating experiments on the OSO and NSN samples

I have been working on the in-situ heating experiments on the free-standing membranes in the past few weeks. After quit a few times attempts I finally have some good videos made from the TEM images that were taken during the

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TEM in-situ heating at Vanderbilt University

Hello everyone! The new FEI Osiris TEM system has been finally setup recently. With the new purchased Gatan single tilt heating holder 628, we were managed to do an in-situ heating experiment with the Osiris system last week. We used

Posted in NRG

Excimer laser annealing of sputtered three-layer stack (1)

Hello everyone! I plan to write several posts in the next couple of weeks about the laser annealing of our sputtered three-layer stack. This laser annealing experiment is done at Center for Nanophase Materials Sciences (CNMS) at Oak Ridge National

Posted in NRG

Are those pinholes or micron-size pores?

Hello everyone! After a long time waiting and setting up, the new AJA and RTP at Vanderbilt University now are ready to go! Here are a couple of pictures of the new AJA and RTP. I have been working on

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Five-layer structure (2)

In order to verify the validity of the result of the five-layer structure I did last time, I deposited another wafer with NOSON stack, which has the identical thickness as that of the last time. The annealing condition is also

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200nm thick Si film from the NSN stack

During my visit last, I deposited a couple of wafers and one of them is to test a even thicker Si film from the NSN stack. The thickness for the Si film is 200nm and the nitride layers are still

Posted in NRG

Pore forming conditions

In the previous posts, I have shown that nanopores can be formed in silicon film sandwiched by two silicon nitride films. This discovery shows silicon nitride as an alternative barrier layer in the stack geometry. In this post, I’ll discuss

Posted in NRG
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