Author: Dave Fang

Pore control… on a wafer scale?

Last week the rotation stage broke in the middle of a deposition.  The wafer came out looking very non-uniform, and judging by the color of the film there was at least a 10 nm gradient.  Since I’m not sure when

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Temperature series w/ 20 nm & 40 nm oxide

Last week, a RTP temperature series was performed on 15 nm Si membranes with 20 nm and 40 nm oxide layers.  The purpose of this study was to 1. evaluate the effect of a thicker oxide on pinhole density and

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Young's modulus of pnc-Si determined by the bulge test

Initial studies into the mechanical properties of pnc-Si were carried out using the “bulge test”.  With JP’s help, we’ve collected a large amount of pressure-displacement measurements.  This technique has been used to investigate thin film membranes suspended over windows of

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Pore tunability with susceptor in RTP

A temperature series was performed last week over seven wafers annealed inside the susceptor (15 nm silicon). The objective was to determine if the current configuration of target materials would show pore tunability over the temperatures of interest (900 –

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Si target composition has dramatic impact on morphology

Last week, we ran several wafers with a silicon target from Refining Systems (Las Vegas).  In addition to the source material being different, the target bond was a silver elastomer vs. the typical indium bond that AJA uses.  Below is

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PECVD vs. PVD morphology

Recently, SiMPore has been exploring alternate ways for depositing our film stack.  We’ve finished our initial testing of a plasma-enhanced chemical vapor deposited film by Rogue Valley (OR), and it appears that the pore formation process is inhibited with the

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n, k data for pnc-Si

We haven’t talked much about the optical properties of pnc-Si, but I thought it would be good to share some of the index and dispersion data I’ve collected using the ellipsometer.  Below are plots of index of refraction (n) and

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Pore tunability, consistency

In the last month, we’ve run several sets of 15 nm pnc-Si wafers over a range of RTP temperatures.  Below is a chart that illustrates the current pore size control we have by tuning annealing temp. The 900 C, 950

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Sputter system update

Last Friday, Chris and I met with Dave Glocker from Isoflux Inc., an expert in physcial vapor deposition.  Specifically, we wanted to get advice on the recent problems we’ve had with the AJA tool. Arcing from Lesker targets We recently

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Carbon 'nanorings' inside our pores?

I had some old carbonized samples kicking around and decided to do some high res TEM yesterday to see what a completely occluded pore looked like.  Below is an image showing a blocked pore and adjacent Si nanocrystal. Inside the

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