Here are the first experiments I have performed with the SepCon slots, under the guidance of Jamie and Kilean. The goal of these experiments is to prove that goat anti-human beads (6.8 um diameter) can be combined with a low…

160112 LO Grant Update

Power Point for my Senior Design   https://docs.google.com/file/d/0B1AH05-mf_tQLTdSMHRWX0NjNGc/edit?usp=sharing  

For this experiment, 3um diameter pores were created using SimPore’s mask. Reactive Ion Etching was used to form the pores in the SiN. Both 25nm and 150nm TEOS oxides were used. An SU8 Structure of 10um lines with 100um square…

Etch Rate in BOE 10:1 Thermal Oxide TEOS PECVD Oxide LTO Sputtered 10:1 BOE at 20C 66 nm/min 266.4 nm/min > 180 nm/min * Each oxide type was placed in BOE w/ surfactant for 10 seconds, then the rate per…

New Lift-off setup, thanks to suggestions and concerns about flatness of the membrane after lift-off.   Floating SU8 – SiN membrane with superstructure submerged. Membrane after removal from water Membrane, dry on first version of lift-off super structure. Membrane after…

Using the same successful procedure as the last lift-off attempt, another large piece of membrane lifted off. This came from the same wafer, but confirms that 30 minutes in BOE is sufficient to etch 25 nm of thermal oxide under…

Using a wafer with a stack of Si-25nm(thermOx)-40nm(SiN)-50nm(PNCSi), lift-off was achieved on a small scale. First the SiN was etched using the standard process Simpore has developed, this also removed most/all of the PNCSi. The standard uChem process was then…

SU-8 3010 (MicroChem) was chosen for its improved adhesion strength, and reduced stress. MicroChem also provides a datasheet on the usage of this negative resist that was followed as a baseline. For Post Exposure Bake (PEB) two methods were implemented,…

The goal of this project is to determine the viability of PEG as a structural support for large area nano porous membranes. This would enable lift-off vs. the current method of etching through the wafer. The ideal properties are that…