Author: Krishanu Shome

Making Slot Devices in URNano facility

The schematic of the slot device is shown below. The main support structure is the pnc-Si membrane with Au or Ag metal on both sides. There is a conformal covering of Alumina shown in blue in the figure which actually

Posted in NRG

Electron Beam Evaporation, RIT vs UR

The CHA e-beam evaporator in RIT had been used traditionally for the deposition of metal on the pnc-Si membranes. The most important factor for metal deposition on the membranes is that the nanoholes must not be blocked. So the metal

Posted in NRG
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