Category: NRG

New etch cell

The highly anticipated 3rd generation etch cell has arrived.  NY Manufacturing did a great job with the design and fabrication.  To give an idea of how far we’ve come, I’ve placed previous etch cells next to the newest. One of

Posted in NRG

Membranes deposited with 'dirty' targets

The AJA sputtering system has 2 oxide targets and 1 silicon target that are focused with stainless steel chimneys.  During our process, films inevitably deposit on the chimney and shutters and after a while start cracking causing flakes of material

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Gold Update

A long running side story to my research has been attempted separations of nanogold. The basic idea is that we want to separate EM quality gold nanoparticles with the membrane, but I have had problems detecting gold in the filtrate

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Fluorescein transport through transwells in 24-well plate

This post is a continuation of the experiments posted a couple of days ago. In that post, I concluded that absorbance measurements of molecules transported through transwells were not possible if the transwell insert was kept in the 24-well during

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Maximum stability in cell culture conditions

This experiment was carried out to determine the maximum life of pnc-Si in cell culture conditions based on discoloration. All the discoloration slowing factors were put together to see how long would the membranes last for. These include: samples in

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Excitation and Emission Wavelengths for Common Fluorophores

Here is the excitation and emission wavelengths for two common fluorophores for transport: rhodamine and fluoroscein. rhodamine fluoroscein max ABS 480 nm 470 nm emission 558 nm 516 nm excitation 524 nm 492 nm The protocol for finding excitation and

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Low temp/ramp rate anneal

Last week I showed some interesting images on the effects of annealing at a low temperature (700 C) with the susceptor.  Below are images from a wafer that was annealed at 700 C with a ramp rate of 10 C/s

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Carbonization – contact angle and discoloration

Last week, Dave carbonized some w501 samples for me so that I could look into discoloration with this new type of silicon stabilization. The carbonization recipe was: – 1 min 50:1 HF strip to form Si:H – Purge RTP with

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TEOS is back

Last week, JP and I resurrected using TEOS as the backside pattern and experimented with using a thermal oxide as the first protective oxide layer (instead of a sputtered oxide).  The idea was to see how the reduced stress in

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Transwells interfere with Tecan measurements

This week, Christine and I have been trying to figure out if we can measure transport in the Tecan with the transwell inserts remaining within the 24-well plates.  Here is a schematic of our idea (with sodium fluorescein, Na-F, as

Posted in NRG
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