Category: NRG

Fluorescent HUVECs in PC transwells

I wanted to do some more fluroescent imaging in transwells to look into background fluroescence.  This was mainly motivated by my inital study.  These are HUVECs stained with 5uM CMFDA and 10uM Hoechst 33342, fixed in formaldehyde and imaged on

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Discoloration – autoclave and Sepcon

I did an experiment earlier this week in the Sepcon and flat format. I intentionally broke membrane windows so that I could compare chips with no intact membranes vs. chips with 1 intact membrane (and also the effect of autoclaving).

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AJA vs. CVC morphology

Last week we attempted to mimic our standard CVC recipe in the AJA system (15 nm Si, 450 C deposition temp, 1000 C RTP).  I should note that the protective oxide thickness in the AJA membrane was 20 nm (not

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Sepcon vs Polished samples

In an effort to imitate Sepcon, I applied nail polish on two samples covering the edges and the back side (well side) and compared its discoloration to Sepcon format and w/o polish sample in 2D format. I used two polished

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Porosity vs Discoloration II

We know: W683 has no visible pores, W685 has usual porosity, and the recent Wafer 747 is ridden with pinholes. I wanted to test this new wafer for discoloration in comparison to the other two and got the expected result.

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High res TEM images @ UR

The image below was taken with UR’s new S/TEM, the FEI Technai F20.  It has the capability of resolving lattice images which should benefit the materials development effort.  However, we will still rely on Karen’s TEM for most of our

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Sepcon-transwell Discoloration IV (2D vs 3D)

Again a repeat, with comparison to the 2D format. To me, it looks like its again a repeat of what we saw in the previous trials. The sample with both intact slits has slightly higher discoloration than the others and

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Sepcon-transwell Discoloration III

Again a repeat of experiment and the observations. As seen above, the sample with both intact slits discolors the fastest (in Sepcon w/memb side down, DMEM w/o FBS, Oven @ 37C). Result is same as the previous two trials. One

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Updated Water Permeability Figure

In the previous post, I used a compound error bar that took into account both image and operator variability. While that seemed to make things a little better, we were still having a problem with w705. I reprocessed a couple

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BBEC Pressurize/Diffusion Separations

I wanted to attempt pressurized and diffusion separations of brain extract using the new movable wafers. I tried pressure cell separations of 1:20 BBEC (clarified brain extract) at 2psi for 40 min. The flow rates were better than the standards

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