Category: NRG

I-V characteristics of coated membranes

I measured the I-V characteristics of our coated membranes on Wed. at RIT. JP observed the measurement. The semicon parameter analyzer in the test lab is “old” but isexactly what we need! Roughly speaking, our coated membraneshave resistance about 2k

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Production from 1.17.2008

Last week’s production yielded six wafers, all deposited at room temperature. Here were the annealing conditions: Wafer 334, 343 – RTP @ 975CWafer 341, 344 – RTP @ 975C + FA @ 1000CWafer 342, 345 – FA @ 1000 C

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100K Microcon : wet-wet

I used the EQ format to test the 100K microcons in a wet-wet trial using DI water. The below illustrates a comparison between the hydraulic permeability of the 100K microcons in a wet-dry format (from tests earlier today) vs. a

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100K Microcon with Bovine Albumin: retest

I reran the 100K Microcon membranes using bovine albumin. This time I ran a set of four fresh membranes with DI water for a preliminary trial. Once complete I used two of the same four membranes with a 1mg/mL solution

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Permeability and burst pressures data for new wafers

The permeability data is very different for films deposited at room temeperature and 400C.The 400C deposited wafers have much higher permeability and more consistent. w335 – RT w336-RT w338 -400C w340 – 400C Burst Pressures

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Pieces of Tong

The ‘Tong equation’ for liquid flow through a nanosieve is I refer you to the original paper for variable definitions (see page 285). For the flows that we see, this will always simplify to the much simpler equation … We

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Gel Analysis

We have recently been discussing the best way to analyze the diffusion and SepCon separation gels. In the following figures, I present line scans of the gels. These appear to be a bit noisy and are somewhat misaligned due to

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Preliminary Data on Gold Nanoparticle Separations

Using wafer 302 I set up 2 20nm and 2 50nm gold diffusion experiments. After 24 hrs I removed the retentate and filtrate and looked for the gold using the Malvern Zetasizer. We can’t perform the diffusion with both 20nm

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Production from 1.10.2008

Last week we processed wafers 335 – 340. Our goal was to track down the source of Cu contamination. We sputtered membrane films both at room temperature and at 400 C. Our thought was that the RT dep. would not

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Air Permeability (w 318, 319, 320, 307) and Updated Burst Pressures

There is some non-uniformity in air permeability based on the position but it is not very clear for wafers 318 and 319. The full wafer measurement in future will make this dependence more obvious.Permeability of w319 is much higher then

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