The Cambridge Microsystems Savannah 200 atomic layer deposition (ALD) system uses a two-step chemical process that alternates pulses of water vapor and trimethylaluminum (TMA) to build a layer of Al2O3 on a silicon substate. Because of the two-step nature of…
Tag: separations
SiN-NP in 50 nm SiN
Using a 6″ wafer, we start with 50 nm of RV SiN, then deposit 40 nm a-Si followed by 20 nm of SiO2. RTP of 1050 C, 100 C/s, 60s. JP patterned the wafer to make standard SEPCON chips. The…
Neither Centrifugation, Sonication, nor Filtration Fix the Aggregation in the Barcikowski Lab Samples
In early May, the Barcikowski lab shipped us four samples of gold nanoparticles for us to run separations on. They took forever to get here, and had aggregated and precipitated by the time they arrived. About a week ago, the…
