Category: NRG

Permeance/Porosity and Burst Pressure

Permeance of a sample was first calculated by taking a TEM image of the membrane and extracting pore size histograms. The flow rate through each pore can be calculated and then summed to determine the flow rate through the sample.

Posted in NRG

Barcikowski separations

The samples of nanoparticles from the Barcikowski lab finally arrived after 9 days in transport. Regrettably, the ice pack they shipped with was completely dead, and it is possible that the samples were in some way ruined. After we received

Posted in NRG

Single Channel Dialyzer

The main difficulty with creating a simulation of the single channel dialysis chip is that the membrane is so very thin (20 nm). This is especially true when compared to its length of 10 mm but also when compared to

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Single Channel 20 nm membrane breakage…

There is a reliability/handling issue with the single slot chips. 0.5 mm x 10 mm slots, 20 nm thick membranes with 40 nm SiN reinforcement. The membranes are easily packaged in an upper fluidic PDMS layer with inlet/outlets and two

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Multi-step annealing of free-standing OSO stack

It is well believed that the pore formation is directly related to the silicon crystallization. In this post, I’m gonna further show that how does the crystallization process affect the pore formation. The crystallization process can be divided into two

Posted in NRG

Pore formation process

We have suspected that those non-open pores in the TEM image of pnc-Si are pits in the silicon membrane for a long time. Last week, I SEMed a sample, oxide (30nm)/Si(25nm)/oxide(30nm) annealed at 800C for 1min, to verify the pits

Posted in NRG

Pore comparison from four different stacks

In this post, pores from four different structures are compared. Those four different structures are nitride/silicon/nitride (NSN), nitride/silicon/oxide (NSO) , oxide/silicon/nitride (OSN) and oxide/silicon/oxide (OSO) . The thicknesses of nitride, oxide and silicon are 30nm, 30nm and 25nm, respectively. Wafers

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The Effect of Pressure on the Sieving Coefficient of a 20nm membrane with 10nm gold

It was speculated that the rate of diffusion through a charged membrane had a direct relationship with pressure – as pressure increases, the kinetic energy of the charged particles is more likely to overcome the electrostatic repulsion of the membrane,

Posted in NRG

shear stress reduction via pnc-Si: COMSOL simulation

Hi all!  Last time we have presented a theoretical perspective on the shear stress reduction enabled by our shear-free microfluidic system.  This time we will show an agreement between the shear-reduction predictions made by the analytical solution and a COMSOL

Posted in NRG

shear stress reduction via pnc-Si: analytical solution

Hello everyone, presented here is a theoretical perspective on the shear stress reduction enabled by our shear-free microfluidic system. Briefly speaking, the shear-free microfluidic system consists of three main components: a flow compartment, the pnc-Si membrane, and a shear-free compartment.

Posted in NRG
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