Karl, Charles and I measured the burst pressure and permeance of some 30-50-30 and 30-100-30 NSN. Burst Pressure: The SEPCONs readily burst at pressures under 1 psi when the flow was directed from the backside of the chip through the…
Category: NRG
micro-porous lift-off TEOS
For this experiment, 3um diameter pores were created using SimPore’s mask. Reactive Ion Etching was used to form the pores in the SiN. Both 25nm and 150nm TEOS oxides were used. An SU8 Structure of 10um lines with 100um square…
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Filtration of Bioconjugated Samples Retains Gold, but We Can't Follow the Ligand
On Friday(which was a great day for science). I ran a series of 5 passes of the bioconjugated gold nanoparticles through 30nm cutoff Gen 3 Sepcons. If you’ll remember, the Barcikowski lab wants the free ligand separated out from the…
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Inventory of Nanoparticles
Nanoparticles Inventory – taken by Karl on 11/2/12. All these particles can be found in the refrigerator. Manufacturer size type amount (approx) expiration date fluorescence (if applicable) BBI 5nm gold colloid 3mL Jan-10 BBI 5nm gold colloid 6mL Aug-11 BBI…
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Five-layer structure
In this post, two unique five-layer structures will be discussed. The first five-layer structure is nitride/oxide/silicon/oxide/nitride (NOSON) with the deposition order from bottom to top. In this structure, the silicon film is 25nm while the nitride and oxide are both…
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High temperature deposition of NSN and OSO stacks
In this post, we’ll discuss a little bit about how would the deposition temperature affect the pore formation and pore morphology. I first show some previous results of the effect of deposition temperature on the porosity and pore size from…
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f-BSA adsorption on Functionalized pnc-Si (Shestopalov Lab)
Katia in Dr. Shestopalov’s Lab functionalized some pnc-Si windowless chips. The process she follows is shown in Figure 1. She provided chips at various stages of the process. “Grignard”, “Diazirine”, and “PEG”. After functionalization, the chips were wetted with…
SU8 lift-off characterization
Etch Rate in BOE 10:1 Thermal Oxide TEOS PECVD Oxide LTO Sputtered 10:1 BOE at 20C 66 nm/min 266.4 nm/min > 180 nm/min * Each oxide type was placed in BOE w/ surfactant for 10 seconds, then the rate per…
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BBB Device V2.6
Given the results of my previous post, I am reworking my design to make it more manufacturable. BBB Device V2-6 Compressed The major change compared to my last design is the inclusion of a full length microscope slide and…
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Autoclaved BBB Device V2.5
To prepare the BBB devices for cell culture, they must be sterilized. To that end, I wanted to see if there were any adverse effects from autoclaving the device. Recipe 4 on the U of R autoclave is a dry…
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